A kinetic 3D lattice Monte-Carlo (MC)model is introduced, which allows to describe the evolution of boron-rich silicon, especially the formation of boron-interstitial clusters of various structures and compositions. Using a refined bcc lattice with lattice constant abcc = aSi/4 a large variety of defect configurations can be mapped essentially without geometrical distortions. The energetics of defects can be specified by means of a set of energy parameters. Boron diffusion is implemented via an interstitial-assisted mechanism. First results of interstitial-mediated boron clustering are presented. The future capabilities to study the kinetics of BnIm cluster formation are outlined.

A kinetic lattice Monte-Carlo approach to the evolution of boron in silicon

La Magna A;
2002

Abstract

A kinetic 3D lattice Monte-Carlo (MC)model is introduced, which allows to describe the evolution of boron-rich silicon, especially the formation of boron-interstitial clusters of various structures and compositions. Using a refined bcc lattice with lattice constant abcc = aSi/4 a large variety of defect configurations can be mapped essentially without geometrical distortions. The energetics of defects can be specified by means of a set of energy parameters. Boron diffusion is implemented via an interstitial-assisted mechanism. First results of interstitial-mediated boron clustering are presented. The future capabilities to study the kinetics of BnIm cluster formation are outlined.
2002
Istituto per la Microelettronica e Microsistemi - IMM
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/53205
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