Lead zirconate titanate (PZT) thin films were deposited by rf magnetron sputtering on Pt/Ti/SiO 2//Si, Au/Ti/SiO2//Si, ITO//glass electrodes and on Si (100) substrates. As deposited films show large excesses of Pb and O and contain different Pb oxides. Annealing treatments in air at 650 and 750 °C carried out in a preheated muffle furnace lead to a decrease of Pb and O content and to formation of the perovskite phase via an intermediate nanocrystalline pyrochlore phase. Phase pure perovskite films are obtained on Pt and ITO electrodes by annealing at 750 °C for ~10 min, while for the same treatment significant amounts of pyrochlore remained on Au electrodes and on Si substrates.

Structural characterization of lead zirconate titanate thin films prepared on different electrodes and on silicon substrates

Natali M;
2011

Abstract

Lead zirconate titanate (PZT) thin films were deposited by rf magnetron sputtering on Pt/Ti/SiO 2//Si, Au/Ti/SiO2//Si, ITO//glass electrodes and on Si (100) substrates. As deposited films show large excesses of Pb and O and contain different Pb oxides. Annealing treatments in air at 650 and 750 °C carried out in a preheated muffle furnace lead to a decrease of Pb and O content and to formation of the perovskite phase via an intermediate nanocrystalline pyrochlore phase. Phase pure perovskite films are obtained on Pt and ITO electrodes by annealing at 750 °C for ~10 min, while for the same treatment significant amounts of pyrochlore remained on Au electrodes and on Si substrates.
2011
CHIMICA INORGANICA E DELLE SUPERFICI
Istituto di Chimica della Materia Condensata e di Tecnologie per l'Energia - ICMATE
annealing
ferroelectric thin films
lead compounds
sputter deposition
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Descrizione: Structural characterization of lead zirconate titanate thin films prepared on different electrodes and on silicon substrates
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/6085
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