In this paper we present the results of an experimental study concerning different contact deposition processes on Semi-Insulating (S.I.) GaAs detectors aiming to study and optimize their performance in terms of leakage current, break-down voltage, charge collection efficiency and energy resolution when irradiated with 60 KeV photons; in particular the effect of the mesa etching treatment on the Schottky barrier side of the detectors has been studied. Such treatment certainly improves the detector performances related to the very important issue of the electric field uniformity. Detectors with satisfactory features in view of their possible application to Digital Radiography have been obtained.

Development of semi-insulating GaAs detectors for digital radiography

Cola A;Quaranta F;
1998

Abstract

In this paper we present the results of an experimental study concerning different contact deposition processes on Semi-Insulating (S.I.) GaAs detectors aiming to study and optimize their performance in terms of leakage current, break-down voltage, charge collection efficiency and energy resolution when irradiated with 60 KeV photons; in particular the effect of the mesa etching treatment on the Schottky barrier side of the detectors has been studied. Such treatment certainly improves the detector performances related to the very important issue of the electric field uniformity. Detectors with satisfactory features in view of their possible application to Digital Radiography have been obtained.
1998
Inglese
61B
633
637
5
Sì, ma tipo non specificato
OHMIC CONTACTS
10
info:eu-repo/semantics/article
262
Bertolucci, E; Bottigli, U; Ciocci, Ma; Cola, A; Conti, M; Fantacci, Me; Romeo, N; Russo, P; Quaranta, F; Vasanelli, L
01 Contributo su Rivista::01.01 Articolo in rivista
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/6675
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