Gd(2)O(3) thin films were grown on Ge(001) substrates by molecular beam epitaxy. The epitaxial character of the film is demonstrated by electron diffraction during the growth. The structural characterization of the films shows that the Gd(2)O(3) forms a bixbyite polymorph with a (110) out-of-plane orientation. The formation of bixbyite structured Gd(2)O(3) is discussed in terms of the atomic arrangement of the oxide planes on the Ge(001) surface.

Epitaxial growth of cubic Gd(2)O(3) thin films on Ge substrates

A Molle;C Wiemer;G Tallarida;
2008

Abstract

Gd(2)O(3) thin films were grown on Ge(001) substrates by molecular beam epitaxy. The epitaxial character of the film is demonstrated by electron diffraction during the growth. The structural characterization of the films shows that the Gd(2)O(3) forms a bixbyite polymorph with a (110) out-of-plane orientation. The formation of bixbyite structured Gd(2)O(3) is discussed in terms of the atomic arrangement of the oxide planes on the Ge(001) surface.
2008
Istituto per la Microelettronica e Microsistemi - IMM
RARE-EARTH-OXIDES; GADOLINIUM; SILICON
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/6998
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