Gd(2)O(3) thin films were grown on Ge(001) substrates by molecular beam epitaxy. The epitaxial character of the film is demonstrated by electron diffraction during the growth. The structural characterization of the films shows that the Gd(2)O(3) forms a bixbyite polymorph with a (110) out-of-plane orientation. The formation of bixbyite structured Gd(2)O(3) is discussed in terms of the atomic arrangement of the oxide planes on the Ge(001) surface.

Epitaxial growth of cubic Gd(2)O(3) thin films on Ge substrates

A Molle;C Wiemer;G Tallarida;
2008

Abstract

Gd(2)O(3) thin films were grown on Ge(001) substrates by molecular beam epitaxy. The epitaxial character of the film is demonstrated by electron diffraction during the growth. The structural characterization of the films shows that the Gd(2)O(3) forms a bixbyite polymorph with a (110) out-of-plane orientation. The formation of bixbyite structured Gd(2)O(3) is discussed in terms of the atomic arrangement of the oxide planes on the Ge(001) surface.
2008
Istituto per la Microelettronica e Microsistemi - IMM
Inglese
17th International Vacuum Congress/13th International Conference on Surface Science/Internatinal Conference on Nanoscience and Technology
100
042048
Sì, ma tipo non specificato
JUL 02-06, 2007
Stockholm
RARE-EARTH-OXIDES; GADOLINIUM; SILICON
3
none
A. Molle; C. Wiemer; M. N. K. Bhuiyan; G. Tallarida; M. Fanciulli
273
info:eu-repo/semantics/conferenceObject
04 Contributo in convegno::04.01 Contributo in Atti di convegno
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/6998
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