In this paper a new approach to obtain low losses coplanar waveguide (CPW) lines is described. A photolithographic process is performed by using SU-8 thick negative photo-resist on low resistivity silicon to obtain CPW lines elevated with respect to the substrate to get the advantages from transmission line structures which are almost on-the-air.

Low Loss Coplanar Lines on Low Resistivity Silicon by SU-8 Thick Negative Photoresist

Marcelli R;Frenguelli L
2005

Abstract

In this paper a new approach to obtain low losses coplanar waveguide (CPW) lines is described. A photolithographic process is performed by using SU-8 thick negative photo-resist on low resistivity silicon to obtain CPW lines elevated with respect to the substrate to get the advantages from transmission line structures which are almost on-the-air.
2005
Istituto per la Microelettronica e Microsistemi - IMM
0-7803-9214-0
RF MEMS
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/70238
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