In this paper a new approach to obtain low losses coplanar waveguide (CPW) lines is described. A photolithographic process is performed by using SU-8 thick negative photo-resist on low resistivity silicon to obtain CPW lines elevated with respect to the substrate to get the advantages from transmission line structures which are almost on-the-air.

Low Loss Coplanar Lines on Low Resistivity Silicon by SU-8 Thick Negative Photoresist

Marcelli R;Frenguelli L
2005

Abstract

In this paper a new approach to obtain low losses coplanar waveguide (CPW) lines is described. A photolithographic process is performed by using SU-8 thick negative photo-resist on low resistivity silicon to obtain CPW lines elevated with respect to the substrate to get the advantages from transmission line structures which are almost on-the-air.
2005
Istituto per la Microelettronica e Microsistemi - IMM
Inglese
Editors: Dan Dascalu, General Chairman; Adrian Rusu, Technical Program Chair
Proceedings of the 28th International Semiconductor Conference, IEEE CAS 2005
28th International Semiconductor Conference, IEEE CAS 2005
107
110
4
0-7803-9214-0
CAS Office
Bucuresti
ROMANIA
Sì, ma tipo non specificato
October 3-5, 2005
Sinaia, Romania
RF MEMS
3
none
Marcelli, R; Catoni, S; Frenguelli, L
273
info:eu-repo/semantics/conferenceObject
04 Contributo in convegno::04.01 Contributo in Atti di convegno
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/70238
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