Synchrotron X-ray reflection topography was used to observe the onset of formation of the strain-relieving misfit dislocations in ZnSe epilayers grown by metalorganic chemical vapor deposition (MOCVD) on low dislocation density (100)GaAs substrates.

ASSESSMENT OF MOCVD-GROWN ZnSe EPILAYERS ON GaAs BY MEANS OF SYNCHROTRON RADIATION TOPOGRAPHY

P PRETE;
2001

Abstract

Synchrotron X-ray reflection topography was used to observe the onset of formation of the strain-relieving misfit dislocations in ZnSe epilayers grown by metalorganic chemical vapor deposition (MOCVD) on low dislocation density (100)GaAs substrates.
2001
Inglese
26
2
779
782
4
Sì, ma tipo non specificato
SYNCHROTRON RADIATION TOPOGRAPHY;MOCVD;ZnSe epilayers
1
info:eu-repo/semantics/article
262
K. MIZUNO; Y. NODA; H. OKAMOTO; ZHANG X; P. PRETE;N. LOVERGINE
01 Contributo su Rivista::01.01 Articolo in rivista
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/7602
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