The influence of excimer laser processing on the thermal stability, especially on the surface roughness evolution of W1yxSixrSi multilayers?MLs.,isstudied.MLswiththecompositionsx s 0?WrSi.andx s 0.33,0.5and0.66wereevaporatedbye-beam evaporation and co-evaporation onto Si substrates. The samples were irradiated by XeCl laser pulses at fluences Fs0.075-0.6 J cmy2 and Ns1 or 100 pulses. Then, they were studied by atomic force microscopy, thus completing previous X-ray scattering analyses. It was found that for xG0.5 the clusters are formed at the MLs surface even in the as-deposited state. Sources of surface roughness are the laser melting itself, Si crystallization and shrinking of the volume connected with the formation of tungsten silicides.
The thermal stability of tungsten/silicon multilayered nanostructures
G Leo;
2001
Abstract
The influence of excimer laser processing on the thermal stability, especially on the surface roughness evolution of W1yxSixrSi multilayers?MLs.,isstudied.MLswiththecompositionsx s 0?WrSi.andx s 0.33,0.5and0.66wereevaporatedbye-beam evaporation and co-evaporation onto Si substrates. The samples were irradiated by XeCl laser pulses at fluences Fs0.075-0.6 J cmy2 and Ns1 or 100 pulses. Then, they were studied by atomic force microscopy, thus completing previous X-ray scattering analyses. It was found that for xG0.5 the clusters are formed at the MLs surface even in the as-deposited state. Sources of surface roughness are the laser melting itself, Si crystallization and shrinking of the volume connected with the formation of tungsten silicides.I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.
