CNR Institutional Research Information System

APPLICATION OF NANOIMPRINT LITHOGRAPHY IN MAGNETISM

2003
2003
Inglese
Patterned magnetic structures are of particular importance for the evelopment of new information technology. They can be used for ultra igh-density recording [1], for the fabrication of magnetic randomly ccessible memories [2] as well as the emerging spin electronics such as spin ransistors, resonant tunnel devices and non-volatile programmable logic [3]. Previously, high resolution magnetic structures were patterned using X-ray ithography [4], electron beam lithography [5], interference lithography [6], s well as ion irradiation induced mixing [7,8]. X-ray lithography is known o be an expensive technology which should not be considered for mass roduction of magnetic recording media. Electron beam lithography is imited by its writing speed for large area patterning [9]. While interference ithography is a simple technique, it is only suitable for the fabrication of egular pattern arrays. Finally, ion irradiation with a stencil mask provides an nteresting alternative but still considerable efforts have to be made in order o show a performance of both high resolution and high throughput. Comparing to the conventional techniques, nanoimprint lithography has hown a number of advantages [10]. It can be easily used to replicate high esolution patterns and it is a low cost technique with a high throughput manufacturing potentiality. For research purposes, nanoimprint lithography is quite flexible, versatile and robust which can be easily implemented in a laboratory environment. In this chapter, we discuss the application of nanoimprint lithography for high resolution magnetic structure patterning. The outline of the chapter is as follows: In part 2 we review some of the fundamental concepts in micromagnetism and present the Landau Lifshitz equation. In part 3 we describe the process optimization of nanoimprint lithography for magnetic structure patterning. In part 4, we briefly describe some commonly used magnetic characterization methods and give a few examples of magnetic nanostructures fabricated by nanoimprint lithography.
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02 Contributo in Volume::02.01 Contributo in volume (Capitolo o Saggio)
268
none
Chen, Y; Natali, M; Sp, Li; Lebib, A
info:eu-repo/semantics/bookPart
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/7819
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