In this study Cathodoluminescence spectroscopy has been used for the first time irt order to detect the base dopant outdiffusion induced by current stress in AlGaAs/GaAs Be-doped HBTs. The results evidence a base dopant diffusion along the growth direction of the HBT structure and suggest that the REID mechanism can he responsible of that. Therefore Cathodoluminescence can he used as a non, destructive technique to study Berillium outdiffusion.

Cathodoluminescence investigation of stress induced berillium outdiffusionin AlGaAs/GaAs HBTs

G Salviati;L Lazzarini;
1997

Abstract

In this study Cathodoluminescence spectroscopy has been used for the first time irt order to detect the base dopant outdiffusion induced by current stress in AlGaAs/GaAs Be-doped HBTs. The results evidence a base dopant diffusion along the growth direction of the HBT structure and suggest that the REID mechanism can he responsible of that. Therefore Cathodoluminescence can he used as a non, destructive technique to study Berillium outdiffusion.
1997
Istituto dei Materiali per l'Elettronica ed il Magnetismo - IMEM
Inglese
IEEE
EDMO - 1997 WORKSHOP ON HIGH PERFORMANCE ELECTRON DEVICES FOR MICROWAVE AND OPTOELECTRONIC APPLICATIONS
1997 Workshop on High Performance Electron Devices for Microwave and Optoelectronic Applications (EDMO)
49
54
0-7803-4135-X
http://ieeexplore.ieee.org/xpl/articleDetails.jsp?reload=true&arnumber=668505
IEEE
New York
STATI UNITI D'AMERICA
Sì, ma tipo non specificato
Nov 24-25, 1997
London, UK
7
none
Cattani, L; Salviati, G; Borgarino, M; Menozzi, R; Fantini, F; Lazzarini, L; Zanotti Fregonara, C
273
info:eu-repo/semantics/conferenceObject
04 Contributo in convegno::04.01 Contributo in Atti di convegno
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/8281
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