This Paper is an overview of recent advances in photonics structures obtained in erbium-activated glasses fabricated by rf-sputtering technique. The fabrication protocols as well as the spectroscopic assessment of SiO2-HfO2 active waveguides and 1-D microcavity will be presented.

Caratterizzazione e fabbricazione con tecnica RF-sputtering di strutture confinate dielettriche

AChiasera;M Ferrari;M Mazzola;S Varas;V Foglietti;G Nunzi Conti;S Pelli;
2011

Abstract

This Paper is an overview of recent advances in photonics structures obtained in erbium-activated glasses fabricated by rf-sputtering technique. The fabrication protocols as well as the spectroscopic assessment of SiO2-HfO2 active waveguides and 1-D microcavity will be presented.
2011
Istituto di fotonica e nanotecnologie - IFN
9788887237122
RF sputtering
planar waveguides
SiO2-HfO2
1D microcavity
photoluminescence
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/86831
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