Dielectric zinc oxide films were prepared by reactive r.f. sputtering on amorphous and crystalline substrates. The optical, morphological and structural properties were studied as a function of the deposition parameters. Scanning electron microscopy, X-ray diffraction and reflection high energy electron diffraction were used to characterize film morphological and structural properties. The optical properties were studied in the 0.5-3.1 eV spectral range by transmittance data. Taking account of the quality of the films described in the present paper, planar light waveguide were prepared on both substrate kinds. Optical loss of about 5 dB/cm were measured on 5cm length waveguides.
DIELECTRIC ZINC-OXIDE FILMS CHARACTERIZATION FOR OPTICAL WAVE-GUIDE
QUARANTA F;
1990
Abstract
Dielectric zinc oxide films were prepared by reactive r.f. sputtering on amorphous and crystalline substrates. The optical, morphological and structural properties were studied as a function of the deposition parameters. Scanning electron microscopy, X-ray diffraction and reflection high energy electron diffraction were used to characterize film morphological and structural properties. The optical properties were studied in the 0.5-3.1 eV spectral range by transmittance data. Taking account of the quality of the films described in the present paper, planar light waveguide were prepared on both substrate kinds. Optical loss of about 5 dB/cm were measured on 5cm length waveguides.I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.
