LO NIGRO, RAFFAELLA
LO NIGRO, RAFFAELLA
Istituto per la Microelettronica e Microsistemi - IMM
Comparing post-deposition and post-metallization annealing treatments on Al2O3/GaN capacitors for different metal gates
2024 Schiliro', E.; Greco, G.; Fiorenza, P.; Panasci, S. E.; Di Franco, S.; Cordier, Y.; Frayssinet, E.; Lo Nigro, R.; Giannazzo, F.; Roccaforte, F.
Improvement of Ti/Al/Ti Ohmic contacts on AlGaN/GaN heterostructures by insertion of a thin carbon interfacial layer
2024 Greco, G.; Di Franco, S.; Lo Nigro, R.; Bongiorno, C.; Spera, M.; Badala, P.; Iucolano, F.; Roccaforte, F.
Structural and electrical correlation in aluminum nitride thin films grown by plasma enhanced atomic layer deposition as interface insulating layers on silicon carbide (4H-SiC)
2024 Galizia, Bruno; Fiorenza, Patrick; Bongiorno, Corrado; Pécz, Béla; Fogarassy, Zsolt; Schiliro', Emanuela; Giannazzo, Filippo; Roccaforte, Fabrizio; LO NIGRO, Raffaella
Towards aluminum oxide/aluminum nitride insulating stacks on 4H–SiC by atomic layer deposition
2024 Galizia, Bruno; Fiorenza, Patrick; Schiliro', Emanuela; Pecz, Bela; Foragassy, Zsolt; Greco, Giuseppe; Saggio, Mario; Cascino, Salvatore; Lo Nigro, Raffaella; Roccaforte, Fabrizio
Al2O3 Layers Grown by Atomic Layer Deposition as Gate Insulator in 3C-SiC MOS Devices
2023 Schiliro, Emanuela; Fiorenza, Patrick; Lo Nigro, Raffaella; Galizia, Bruno; Greco, Giuseppe; Di Franco, Salvatore; Bongiorno, Corrado; La Via, Francesco; Giannazzo, Filippo; Roccaforte, Fabrizio
Direct atomic layer deposition of ultra-thin Al2O3 and HfO2 films on gold-supported monolayer MoS2
2023 Schiliro', E; Panasci, S. E.; Mio, Am; Nicotra, G; Agnello, S; Pecz, B; Z Radnoczi, Gy; Deretzis, I; La Magna, A.; Roccaforte, F; Lo Nigro, R.; Giannazzo, F
Aluminum Frenkel defects cause hysteresis in Al2O3/AlGaN capacitors
2022 Deretzis, I.; Fiorenza, P.; Fazio, T.; Schiliro', E.; Lo Nigro, R.; Greco, G.; Fisicaro, G.; Roccaforte, F.; La Magna, A.
Early Growth Stages of Aluminum Oxide (Al2O3) Insulating Layers by Thermal- and Plasma-Enhanced Atomic Layer Deposition on AlGaN/GaN Heterostructures
2022 Schiliro', E.; Fiorenza, P.; Greco, G.; Monforte, F.; Condorelli, G. G.; Roccaforte, F.; Giannazzo, F.; Lo Nigro, R.
Electrical evolution of W and WC Schottky contacts on 4H-SiC at different annealing temperatures
2022 Vivona, M.; Bellocchi, G.; Lo Nigro, R.; Rascunà, S.; Roccaforte, F.
Nanotechnology for Electronic Materials and Devices
2022 Lo Nigro, R.; Fiorenza, P.; Pecz, B.; Eriksson, J.
Structural and Insulating Behaviour of High-Permittivity Binary Oxide Thin Films for Silicon Carbide and Gallium Nitride Electronic Devices
2022 Lo Nigro, Raffaella; Fiorenza, Patrick; Greco, Giuseppe; Schiliro', Emanuela; Roccaforte, Fabrizio
Temperature and time dependent electron trapping in Al2O3 thin films onto AlGaN/GaN heterostructures
2022 Fiorenza, Patrick; Schiliro', Emanuela; Greco, Giuseppe; Vivona, Marilena; Cannas, Marco; Giannazzo, Filippo; Lo Nigro, Raffaella; Roccaforte, Fabrizio
Direct Atomic Layer Deposition of Ultrathin Aluminum Oxide on Monolayer MoS2 Exfoliated on Gold: The Role of the Substrate
2021 Schiliro', E.; Lo Nigro, R.; Panasci, S. E.; Agnello, S.; Cannas, M.; Gelardi, F. M.; Roccaforte, F.; Giannazzo, F.
Substrate-driven atomic layer deposition of high-κ dielectrics on 2d materials
2021 Schiliro', E.; Lo Nigro, R.; Roccaforte, F.; Giannazzo, F.
Aluminum oxide nucleation in the early stages of atomic layer deposition on epitaxial graphene
2020 Schiliro', E.; Lo Nigro, R.; Panasci, S. E.; Gelardi, F. M.; Agnello, S.; Yakimova, R.; Roccaforte, F.; Giannazzo, F.
Atomic layer deposition of high-k insulators on epitaxial graphene: A review
2020 Giannazzo, F.; Schiliro', E.; Lo Nigro, R.; Roccaforte, F.; Yakimova, R.
Comparison between thermal and plasma enhanced atomic layer deposition processes for the growth of HfO2 dielectric layers
2020 Lo Nigro, Raffaella; Schiliro', Emanuela; Mannino, Giovanni; Di Franco, Salvatore; Roccaforte, Fabrizio
Correlating electron trapping and structural defects in Al2O3 thin films deposited by plasma enhanced atomic layer deposition
2020 Schiliro', Emanuela; Fiorenza, Patrick; Bongiorno, Corrado; Spinella, ROSARIO CORRADO; DI FRANCO, Salvatore; Greco, Giuseppe; LO NIGRO, Raffaella; Roccaforte, Fabrizio
Current transport mechanisms in au-free metallizations for cmos compatible gan hemt technology
2020 Roccaforte, F.; Spera, M.; Di Franco, S.; Lo Nigro, R.; Fiorenza, P.; Giannazzo, F.; Iucolano, F.; Greco, G.
Nanolaminated Al2O3/HfO2 dielectrics for silicon carbide based devices
2020 Lo Nigro, Raffaella; Schiliro', Emanuela; Fiorenza, Patrick; Roccaforte, Fabrizio
| Titolo | Data di pubblicazione | Autore(i) | File |
|---|---|---|---|
| Comparing post-deposition and post-metallization annealing treatments on Al2O3/GaN capacitors for different metal gates | 1-gen-2024 | Schiliro', E.; Greco, G.; Fiorenza, P.; Panasci, S. E.; Di Franco, S.; Cordier, Y.; Frayssinet, E.; Lo Nigro, R.; Giannazzo, F.; Roccaforte, F. | |
| Improvement of Ti/Al/Ti Ohmic contacts on AlGaN/GaN heterostructures by insertion of a thin carbon interfacial layer | 1-gen-2024 | Greco, G.; Di Franco, S.; Lo Nigro, R.; Bongiorno, C.; Spera, M.; Badala, P.; Iucolano, F.; Roccaforte, F. | |
| Structural and electrical correlation in aluminum nitride thin films grown by plasma enhanced atomic layer deposition as interface insulating layers on silicon carbide (4H-SiC) | 1-gen-2024 | Galizia, Bruno; Fiorenza, Patrick; Bongiorno, Corrado; Pécz, Béla; Fogarassy, Zsolt; Schiliro', Emanuela; Giannazzo, Filippo; Roccaforte, Fabrizio; LO NIGRO, Raffaella | |
| Towards aluminum oxide/aluminum nitride insulating stacks on 4H–SiC by atomic layer deposition | 1-gen-2024 | Galizia, Bruno; Fiorenza, Patrick; Schiliro', Emanuela; Pecz, Bela; Foragassy, Zsolt; Greco, Giuseppe; Saggio, Mario; Cascino, Salvatore; Lo Nigro, Raffaella; Roccaforte, Fabrizio | |
| Al2O3 Layers Grown by Atomic Layer Deposition as Gate Insulator in 3C-SiC MOS Devices | 1-gen-2023 | Schiliro, Emanuela; Fiorenza, Patrick; Lo Nigro, Raffaella; Galizia, Bruno; Greco, Giuseppe; Di Franco, Salvatore; Bongiorno, Corrado; La Via, Francesco; Giannazzo, Filippo; Roccaforte, Fabrizio | |
| Direct atomic layer deposition of ultra-thin Al2O3 and HfO2 films on gold-supported monolayer MoS2 | 1-gen-2023 | Schiliro', E; Panasci, S. E.; Mio, Am; Nicotra, G; Agnello, S; Pecz, B; Z Radnoczi, Gy; Deretzis, I; La Magna, A.; Roccaforte, F; Lo Nigro, R.; Giannazzo, F | |
| Aluminum Frenkel defects cause hysteresis in Al2O3/AlGaN capacitors | 1-gen-2022 | Deretzis, I.; Fiorenza, P.; Fazio, T.; Schiliro', E.; Lo Nigro, R.; Greco, G.; Fisicaro, G.; Roccaforte, F.; La Magna, A. | |
| Early Growth Stages of Aluminum Oxide (Al2O3) Insulating Layers by Thermal- and Plasma-Enhanced Atomic Layer Deposition on AlGaN/GaN Heterostructures | 1-gen-2022 | Schiliro', E.; Fiorenza, P.; Greco, G.; Monforte, F.; Condorelli, G. G.; Roccaforte, F.; Giannazzo, F.; Lo Nigro, R. | |
| Electrical evolution of W and WC Schottky contacts on 4H-SiC at different annealing temperatures | 1-gen-2022 | Vivona, M.; Bellocchi, G.; Lo Nigro, R.; Rascunà, S.; Roccaforte, F. | |
| Nanotechnology for Electronic Materials and Devices | 1-gen-2022 | Lo Nigro, R.; Fiorenza, P.; Pecz, B.; Eriksson, J. | |
| Structural and Insulating Behaviour of High-Permittivity Binary Oxide Thin Films for Silicon Carbide and Gallium Nitride Electronic Devices | 1-gen-2022 | Lo Nigro, Raffaella; Fiorenza, Patrick; Greco, Giuseppe; Schiliro', Emanuela; Roccaforte, Fabrizio | |
| Temperature and time dependent electron trapping in Al2O3 thin films onto AlGaN/GaN heterostructures | 1-gen-2022 | Fiorenza, Patrick; Schiliro', Emanuela; Greco, Giuseppe; Vivona, Marilena; Cannas, Marco; Giannazzo, Filippo; Lo Nigro, Raffaella; Roccaforte, Fabrizio | |
| Direct Atomic Layer Deposition of Ultrathin Aluminum Oxide on Monolayer MoS2 Exfoliated on Gold: The Role of the Substrate | 1-gen-2021 | Schiliro', E.; Lo Nigro, R.; Panasci, S. E.; Agnello, S.; Cannas, M.; Gelardi, F. M.; Roccaforte, F.; Giannazzo, F. | |
| Substrate-driven atomic layer deposition of high-κ dielectrics on 2d materials | 1-gen-2021 | Schiliro', E.; Lo Nigro, R.; Roccaforte, F.; Giannazzo, F. | |
| Aluminum oxide nucleation in the early stages of atomic layer deposition on epitaxial graphene | 1-gen-2020 | Schiliro', E.; Lo Nigro, R.; Panasci, S. E.; Gelardi, F. M.; Agnello, S.; Yakimova, R.; Roccaforte, F.; Giannazzo, F. | |
| Atomic layer deposition of high-k insulators on epitaxial graphene: A review | 1-gen-2020 | Giannazzo, F.; Schiliro', E.; Lo Nigro, R.; Roccaforte, F.; Yakimova, R. | |
| Comparison between thermal and plasma enhanced atomic layer deposition processes for the growth of HfO2 dielectric layers | 1-gen-2020 | Lo Nigro, Raffaella; Schiliro', Emanuela; Mannino, Giovanni; Di Franco, Salvatore; Roccaforte, Fabrizio | |
| Correlating electron trapping and structural defects in Al2O3 thin films deposited by plasma enhanced atomic layer deposition | 1-gen-2020 | Schiliro', Emanuela; Fiorenza, Patrick; Bongiorno, Corrado; Spinella, ROSARIO CORRADO; DI FRANCO, Salvatore; Greco, Giuseppe; LO NIGRO, Raffaella; Roccaforte, Fabrizio | |
| Current transport mechanisms in au-free metallizations for cmos compatible gan hemt technology | 1-gen-2020 | Roccaforte, F.; Spera, M.; Di Franco, S.; Lo Nigro, R.; Fiorenza, P.; Giannazzo, F.; Iucolano, F.; Greco, G. | |
| Nanolaminated Al2O3/HfO2 dielectrics for silicon carbide based devices | 1-gen-2020 | Lo Nigro, Raffaella; Schiliro', Emanuela; Fiorenza, Patrick; Roccaforte, Fabrizio |