TAMARRI, FABRIZIO

TAMARRI, FABRIZIO  

Istituto per lo Studio dei Materiali Nanostrutturati - ISMN - Sede Secondaria Bologna  

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Risultati 1 - 12 di 12 (tempo di esecuzione: 0.021 secondi).
Titolo Data di pubblicazione Autore(i) File
Fully grating for NIR synthetic spectra generation in correlation spectroscopy 1-gen-2024 Chiarini, M.; Bellettato, M.; Bentini, G. G.; Bonafe', F.; Elmi, I.; Morandi, V.; Pizzochero, G.; Tamarri, F.
Lightweight Gas Sensor Based on MEMS Pre-Concentration and Infrared Absorption Spectroscopy Inside a Hollow Fiber 1-gen-2023 Viola, Roberto; Liberatore, Nicola; Mengali, Sandro; Elmi, Ivan; Tamarri, Fabrizio; Zampolli, Stefano
Experimental analysis and simulation of the optical properties of gold nano-particles on sodium alginate 1-gen-2022 Summonte, Caterina; Maurizi, Alberto; Rizzoli, Rita; Tamarri, Fabrizio; Bertoldo, Monica; Bolognini, Gabriele; Maccagnani, Piera
Ion implantation and activation of aluminum in bulk 3C-SiC and 3C-SiC on Si 1-gen-2022 Torregrosa, F.; Canino, M.; Li, F.; Tamarri, F.; Roux, B.; Morata, S.; La Via, F.; Zielinski, M.; Nipoti, R.
Effects of N implantation before Gate Oxidation on the Performance of 4H-SiC MOSFET 1-gen-2009 Poggi, A; Moscatelli, F; Solmi, S; Nipoti, R; Tamarri, F; Pizzochero, G
Room temperature annealing effects on leakage current of ion implanted p+n 4H-SiC diodes 1-gen-2009 Moscatelli, Francesco; Bergamini, Fabio; Poggi, Antonella; Passini, Mara; Tamarri, Fabrizio; Bianconi, Marco; Nipoti, Roberta
Room temperature annealing effects on leakage current of ion implanted p+n 4H-SiC diodes 1-gen-2009 Moscatelli, F; Bergamini, F; Poggi, A; Passini, M; Tamarri, F; Bianconi, M; Nipoti, R
An improved detection system for low energy Scanning Transmission Electron Microscopy 1-gen-2008 Morandi, V; Migliori, A; Maccagnani, P; Tamarri, F; Ferroni, M
Characterization of MOS capacitors fabricated on n-type 4H-SiC implanted with nitrogen at high dose 1-gen-2007 Poggi, A; Moscatelli, F; Hijikata, Y; Solmi, S; Sanmartin, M; Tamarri, F; Nipoti, R
Ion implantation p+/n diodes: post-implantation annealing in a Silane ambient in a cold-wall low pressure CVD reactor 1-gen-2006 Bergamini, F; Rao, S P; Poggi, A; Tamarri, F; Saddow, Se; Nipoti, R
Ion Implanted p(+)/n diodes: post-implantation annealing in a silane ambient in a cold-wall low-pressure CVD reactor 1-gen-2006 Bergamini, ; Fabio, ; Rao, ; Shailaja, P; Poggi, Antonella; Poggi, Antonella; Tamarri, Fabrizio; Tamarri, Fabrizio; Saddow, ; Stephen, E; Nipoti, Roberta; Nipoti, Roberta
Resistance changes due to Cu transport and precipitation during electromigration in submicrometric Al-0.5%Cu lines 1-gen-1996 A Scorzoni; I De Munari; R Balboni; F Tamarri; A Garulli; F Fantini