The random laser emission from the functionalized thienyl-S,S-dioxide quinquethiophene (T5OCx) in confined patterns with different shapes is demonstrated. Functional patterning of the light emitter organic material in well defined features is obtained by spontaneous molecular self-assembly guided by surface tension driven (STD) lithography. Such controlled supramolecular nano-aggregates act as scattering centers allowing the fabrication of one-component organic lasers with no external resonator and with desired shape and efficiency. Atomic force microscopy shows that different geometric pattern with different supramolecular organization obtained by the lithographic process tailors the coherent emission properties by controlling the distribution and the size of the random scatterers.

Random laser from engineered nanostructures obtained by surface tension driven lithography

Neda Ghofraniha;Ilenia Viola;Francesca Di Maria;Giovanna Barbarella;Giuseppe Gigli;Claudio Conti
2013

Abstract

The random laser emission from the functionalized thienyl-S,S-dioxide quinquethiophene (T5OCx) in confined patterns with different shapes is demonstrated. Functional patterning of the light emitter organic material in well defined features is obtained by spontaneous molecular self-assembly guided by surface tension driven (STD) lithography. Such controlled supramolecular nano-aggregates act as scattering centers allowing the fabrication of one-component organic lasers with no external resonator and with desired shape and efficiency. Atomic force microscopy shows that different geometric pattern with different supramolecular organization obtained by the lithographic process tailors the coherent emission properties by controlling the distribution and the size of the random scatterers.
2013
Istituto per i Processi Chimico-Fisici - IPCF
Istituto per la Sintesi Organica e la Fotoreattivita' - ISOF
Istituto dei Sistemi Complessi - ISC
Istituto Nanoscienze - NANO
Nano-lithography
Nano-photonics
Oligo-Thiophene
Random laser
Surface tension driven lithography
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/117793
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