This paper reports on the electrical characteristics of silicon photomultipliers (SiPM) with optimized optical trench technology. The SiPM arrays were characterized from single pixels up to the full 64×64 pixel device. The data clearly show a perfect scaling of the dark current with the pixel number, thus indicating an almost ideal insulation among the pixels in the whole voltage operating range.

Optimized Silicon Photomultipliers with optical trenches

R Pagano;D Corso;S Lombardo;S Libertino;
2011

Abstract

This paper reports on the electrical characteristics of silicon photomultipliers (SiPM) with optimized optical trench technology. The SiPM arrays were characterized from single pixels up to the full 64×64 pixel device. The data clearly show a perfect scaling of the dark current with the pixel number, thus indicating an almost ideal insulation among the pixels in the whole voltage operating range.
2011
Istituto per la Microelettronica e Microsistemi - IMM
Inglese
Proceedings of the European Solid-State Device Research Conference (ESSDERC), 2011
European Solid-State Device Research Conference (ESSDERC) 2011
183
186
4
978-1-4577-0705-6
Sì, ma tipo non specificato
4
none
R. Pagano; D. Corso; S. Lombardo; S. Libertino; G. Valvo; D. Sanfilippo; A. Russo; P.G. Fallica; A. Pappalardo; P. Finocchiaro
273
info:eu-repo/semantics/conferenceObject
04 Contributo in convegno::04.01 Contributo in Atti di convegno
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/118730
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