The lattice strain induced by the thermal evolution of B-B pairs formed in a Si1-xBx/Si layer as a consequence of He irradiation has been studied in situ in an N-2 atmosphere, by using a high resolution x-ray diffractometer equipped with a hot stage sample holder. The collection of repeated rocking curves during a linear temperature (T) ramp allowed monitoring of the effects of the B-B pair thermal evolution on the epilayer lattice parameter a (and equally its strain) during the whole of the annealing from room T up to their complete dissolution (883 degrees C). By analysing the evolution of a(T) we extracted detailed information about the kinetics of B-B pair evolution. This allowed us to determine an experimental description of the B-B pair dissolution path in good agreement with recent ab initio calculations.

In situ thermal evolution of B-B pairs in crystalline Si: a spectroscopic high resolution x-ray diffraction study

De Salvador D;Napolitani E;Bruno E;Mirabella S;
2008

Abstract

The lattice strain induced by the thermal evolution of B-B pairs formed in a Si1-xBx/Si layer as a consequence of He irradiation has been studied in situ in an N-2 atmosphere, by using a high resolution x-ray diffractometer equipped with a hot stage sample holder. The collection of repeated rocking curves during a linear temperature (T) ramp allowed monitoring of the effects of the B-B pair thermal evolution on the epilayer lattice parameter a (and equally its strain) during the whole of the annealing from room T up to their complete dissolution (883 degrees C). By analysing the evolution of a(T) we extracted detailed information about the kinetics of B-B pair evolution. This allowed us to determine an experimental description of the B-B pair dissolution path in good agreement with recent ab initio calculations.
2008
INFM
AB-INITIO
IMPLANTED SILICON
ROOM-TEMPERATURE
BORON-DIFFUSION
HE IMPLANTATION
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/119957
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