A TEM study of GaAs nanoislands grown on (001) Si substrate by the Droplet Epitaxy technique is presented. The nanoislands turn out to be monocrystalline in perfect epitaxial relationship with Si. By X-ray microanalysis in the TEM it is also seen that the islands are stoichiometric. TEM images of the moiré fringes revealed the presence of dislocations at the nanoislands suggesting strain relaxation.

TEM Characterization of GaAs Nanoislands on Si

C Frigeri;
2011

Abstract

A TEM study of GaAs nanoislands grown on (001) Si substrate by the Droplet Epitaxy technique is presented. The nanoislands turn out to be monocrystalline in perfect epitaxial relationship with Si. By X-ray microanalysis in the TEM it is also seen that the islands are stoichiometric. TEM images of the moiré fringes revealed the presence of dislocations at the nanoislands suggesting strain relaxation.
2011
Istituto dei Materiali per l'Elettronica ed il Magnetismo - IMEM
978-981-4343-89-3
MBE
GaAs
droplet epitaxy
TEM
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/121188
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