A reassessment of the structure of the impurity atmospheres at dislocations in GaAs highly doped with Te is proposed on the basis of new results obtained by DSL etching, EBIC, microRaman and TEM. The formation of etch depressions around dislocations suggests that an enhanced formation of the TeAsVGa acceptor complex has locally occurred, driven by the gettering of Te by the dislocations. This causes an undersaturation of Ga vacancies which favours the generation of extrinsic Frank loops around the dislocations and promotes dislocation climb.

A reassessment of Te-doped GaAs

C Frigeri;
1997

Abstract

A reassessment of the structure of the impurity atmospheres at dislocations in GaAs highly doped with Te is proposed on the basis of new results obtained by DSL etching, EBIC, microRaman and TEM. The formation of etch depressions around dislocations suggests that an enhanced formation of the TeAsVGa acceptor complex has locally occurred, driven by the gettering of Te by the dislocations. This causes an undersaturation of Ga vacancies which favours the generation of extrinsic Frank loops around the dislocations and promotes dislocation climb.
1997
Istituto dei Materiali per l'Elettronica ed il Magnetismo - IMEM
0-7503-0464-2
Te-doped GaAs
photoetching
impurity Atmosphere
EBIC
TEM
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/123371
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