A reassessment of the structure of the impurity atmospheres at dislocations in GaAs highly doped with Te is proposed on the basis of new results obtained by DSL etching, EBIC, microRaman and TEM. The formation of etch depressions around dislocations suggests that an enhanced formation of the TeAsVGa acceptor complex has locally occurred, driven by the gettering of Te by the dislocations. This causes an undersaturation of Ga vacancies which favours the generation of extrinsic Frank loops around the dislocations and promotes dislocation climb.

A reassessment of Te-doped GaAs

C Frigeri;
1997

Abstract

A reassessment of the structure of the impurity atmospheres at dislocations in GaAs highly doped with Te is proposed on the basis of new results obtained by DSL etching, EBIC, microRaman and TEM. The formation of etch depressions around dislocations suggests that an enhanced formation of the TeAsVGa acceptor complex has locally occurred, driven by the gettering of Te by the dislocations. This causes an undersaturation of Ga vacancies which favours the generation of extrinsic Frank loops around the dislocations and promotes dislocation climb.
1997
Istituto dei Materiali per l'Elettronica ed il Magnetismo - IMEM
Inglese
Cullis, AG; Hutchison, JL
Microscopy of Semiconducting Materials 1997
Royal-Microscopical-Society Conference on Microscopy of Semiconducting Materials
635
638
0-7503-0464-2
IOP Publishing Ltd.
Bristol BS1 6BE
REGNO UNITO DI GRAN BRETAGNA
Sì, ma tipo non specificato
April 7-10, 1997
UNIV OXFORD, OXFORD, UK
Te-doped GaAs
photoetching
impurity Atmosphere
EBIC
TEM
1
none
C. Frigeri; J.L. Weyher; J. Jiménez;P. Martín
273
info:eu-repo/semantics/conferenceObject
04 Contributo in convegno::04.01 Contributo in Atti di convegno
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/123371
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