Typical dislocation atmospheres of different n-type GaAs wafers have been studied by means of DSL photoetching, SEM-EBIC and microRaman spectroscopy. Different aspects concerning the properties of these defects have been studied, i.e. local crystal misorientation, carrier depletion depth, local doping and residual strain.

Study of the dislocation atmospheres in n-type GaAs by DSL photoetching, EBIC and microRaman measurements

C Frigeri;
1995

Abstract

Typical dislocation atmospheres of different n-type GaAs wafers have been studied by means of DSL photoetching, SEM-EBIC and microRaman spectroscopy. Different aspects concerning the properties of these defects have been studied, i.e. local crystal misorientation, carrier depletion depth, local doping and residual strain.
1995
Istituto dei Materiali per l'Elettronica ed il Magnetismo - IMEM
0-87849-716-1
GaAs
EBIC
photoetching
dislocation Atmosphere
microRaman
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/123406
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