InGaAs SQWs grown on vicinal (100) GaAs substrates exhibit wide macrosteps that cause marked lateral and vertical fluctuations in composition and thick-ness that increase with increasing layer thickness and composition. Macrosteps are absent for growth on exact (100) oriented substrates. Dislocation loops in the substrate and threading dislocations, both generated by reaction between misfit dislocations, are created more easily for growth on vicinal substrates than substrates of exact orientation.

A TEM study of InGaAs/GaAs SQWs grown by MOVPE on (100) and 2° off (100) GaAs substrates

C Frigeri;
1995

Abstract

InGaAs SQWs grown on vicinal (100) GaAs substrates exhibit wide macrosteps that cause marked lateral and vertical fluctuations in composition and thick-ness that increase with increasing layer thickness and composition. Macrosteps are absent for growth on exact (100) oriented substrates. Dislocation loops in the substrate and threading dislocations, both generated by reaction between misfit dislocations, are created more easily for growth on vicinal substrates than substrates of exact orientation.
1995
Istituto dei Materiali per l'Elettronica ed il Magnetismo - IMEM
0-7503-0347-6
InGaAs/GaAs
SQW
TEM
MOVPE
File in questo prodotto:
Non ci sono file associati a questo prodotto.

I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.

Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/123433
Citazioni
  • ???jsp.display-item.citation.pmc??? ND
  • Scopus ND
  • ???jsp.display-item.citation.isi??? ND
social impact