InGaAs SQWs grown on vicinal (100) GaAs substrates exhibit wide macrosteps that cause marked lateral and vertical fluctuations in composition and thick-ness that increase with increasing layer thickness and composition. Macrosteps are absent for growth on exact (100) oriented substrates. Dislocation loops in the substrate and threading dislocations, both generated by reaction between misfit dislocations, are created more easily for growth on vicinal substrates than substrates of exact orientation.

A TEM study of InGaAs/GaAs SQWs grown by MOVPE on (100) and 2° off (100) GaAs substrates

C Frigeri;
1995

Abstract

InGaAs SQWs grown on vicinal (100) GaAs substrates exhibit wide macrosteps that cause marked lateral and vertical fluctuations in composition and thick-ness that increase with increasing layer thickness and composition. Macrosteps are absent for growth on exact (100) oriented substrates. Dislocation loops in the substrate and threading dislocations, both generated by reaction between misfit dislocations, are created more easily for growth on vicinal substrates than substrates of exact orientation.
1995
Istituto dei Materiali per l'Elettronica ed il Magnetismo - IMEM
Inglese
Cullis, AG; StatonBevan, AE
Microscopy of Semiconducting Materials 1995
Institute-of-Physics Conference on Microscopy of Semiconducting Materials 1995
361
364
0-7503-0347-6
IOP Publishing Ltd.
Bristol BS1 6BE
REGNO UNITO DI GRAN BRETAGNA
Sì, ma tipo non specificato
20-23 March 1995
Oxford (UK)
InGaAs/GaAs
SQW
TEM
MOVPE
7
none
Frigeri, C; Di Paola, A; M Ritchie, D; Longo, F; Brinciotti, A; Riva, M; Vidimari, F
273
info:eu-repo/semantics/conferenceObject
04 Contributo in convegno::04.01 Contributo in Atti di convegno
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/123433
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