TEM and SIMS analyses of InP submitted to single and double implantation have allowed to establish that the end of range (EOR) dislocation loops, mostly of the Frank type, are efficient gettering sites for the implanted Fe dopant. The gettering rate increases with increasing annealing temperature, due to both increased Fe mobility and loop coarsening. Besides the EOR loops, other extended defects, e.g. the tangled networks of dislocations at the interfaces of bands of twins, are seen to getter Fe. Such gettering strongly affects the diffusion of Fe upon annealing.

Gettering of Fe at the End of Range Loops in Fe-Implanted InP

C Frigeri;G Rossetto
1999

Abstract

TEM and SIMS analyses of InP submitted to single and double implantation have allowed to establish that the end of range (EOR) dislocation loops, mostly of the Frank type, are efficient gettering sites for the implanted Fe dopant. The gettering rate increases with increasing annealing temperature, due to both increased Fe mobility and loop coarsening. Besides the EOR loops, other extended defects, e.g. the tangled networks of dislocations at the interfaces of bands of twins, are seen to getter Fe. Such gettering strongly affects the diffusion of Fe upon annealing.
1999
Istituto dei Materiali per l'Elettronica ed il Magnetismo - IMEM
InP
Fe
implantation
SIMS
TEM
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/123766
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