A study of the relationship between the macrosteps caused by the substrate misorientation and dislocation nucleation in MOVPE-grown InGaAs/GaAs is presented. The macrosteps could favour strain relaxation and the decrease of the critical thickness, also by generation of misfit dislocations in the 1/2h110if011g glide system, as they can provide sites for stress accumulation above the average value far from the macrosteps. This adds up to the enhanced homogeneous dislocation nucleation associated with the offcut angle. The use of offcut substrates thus produces both compositional inhomogeneities and an increase of the overall dislocation density.
Growth of InGaAs/GaAs on Offcut Substrates by MOVPE: Influence on Macrosteps and Dislocations Formation
C Frigeri;
1998
Abstract
A study of the relationship between the macrosteps caused by the substrate misorientation and dislocation nucleation in MOVPE-grown InGaAs/GaAs is presented. The macrosteps could favour strain relaxation and the decrease of the critical thickness, also by generation of misfit dislocations in the 1/2h110if011g glide system, as they can provide sites for stress accumulation above the average value far from the macrosteps. This adds up to the enhanced homogeneous dislocation nucleation associated with the offcut angle. The use of offcut substrates thus produces both compositional inhomogeneities and an increase of the overall dislocation density.I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.
