A sereies of vanadyl complexes of general formula VO(L)2 where L is a beta-diketonate ligand are used as precursors for the synthesis of vanadium oxides thin films by CVD. The depositions, carried out on Alpha-Al2O3 in O2 or N2 atmospheres, lead to films mainly composed of VO2. The influcence of different ligands and synthesis conditions on the composition, microstructure and morphology of the samples is studied by XPS, Raman, XRD and AFM. The Thermal decomposition of the precursors is investigated by Mass Spectrometry.

Vanadium oxides thin films from vanadyl precursors

BARRECA, DAVIDE;
1997

Abstract

A sereies of vanadyl complexes of general formula VO(L)2 where L is a beta-diketonate ligand are used as precursors for the synthesis of vanadium oxides thin films by CVD. The depositions, carried out on Alpha-Al2O3 in O2 or N2 atmospheres, lead to films mainly composed of VO2. The influcence of different ligands and synthesis conditions on the composition, microstructure and morphology of the samples is studied by XPS, Raman, XRD and AFM. The Thermal decomposition of the precursors is investigated by Mass Spectrometry.
1997
Inglese
Electrochemical Society Proceedings (Chemical Vapor Deposition - Proceedings of the Fourtheenth International Conferences and EUROCVD 11
International Symposium on Chemical Vapor Deposition
952
959
8
Sì, ma tipo non specificato
31 Agosto - 5 Settembre 1997
Parigi
1
none
Barreca, Davide; Vettori, Umberto
273
info:eu-repo/semantics/conferenceObject
04 Contributo in convegno::04.01 Contributo in Atti di convegno
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/123775
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