Nanocrystalline CeO2-ZrO2 thin films were deposited via CVD (Chemical Vapor Deposition) on alumina and glass substrates using Ce(dpm)4 and Zr(OiPr)3(dpm) as precursors. The adopted strategy consisted in the sequential deposition of single-phase layers and subsequent thermal treatment in air. The depositions were performed in a low pressure hot-wall CVD system in an O2-N2 atmosphere at 380°C, yielding greenish-transparent adherent layers. The microstructure, composition and morphology of the films were analyzed by XRD (X-ray Diffraction), XPS (X-ray Photoelectron Spectroscopy), SIMS (Secondary Ion Mass Spectrometry) and AFM (Atomic Force Microscopy).
Nanophasic CeO2/ZrO2 single and mixed oxides thin films obtained by CVD
L Armelao;D Barreca;R Gerbasi;P Zanella;S Barison;S Daolio;M Fabrizio
2001
Abstract
Nanocrystalline CeO2-ZrO2 thin films were deposited via CVD (Chemical Vapor Deposition) on alumina and glass substrates using Ce(dpm)4 and Zr(OiPr)3(dpm) as precursors. The adopted strategy consisted in the sequential deposition of single-phase layers and subsequent thermal treatment in air. The depositions were performed in a low pressure hot-wall CVD system in an O2-N2 atmosphere at 380°C, yielding greenish-transparent adherent layers. The microstructure, composition and morphology of the films were analyzed by XRD (X-ray Diffraction), XPS (X-ray Photoelectron Spectroscopy), SIMS (Secondary Ion Mass Spectrometry) and AFM (Atomic Force Microscopy).I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.
