In this paper we analyze the extent of grain orientation before and after the C49-C54 transformation in TiSi2, depending on the substrate microstructure and the lateral dimensions of the film. In the former case, for blanket configuration, we make a comparison to the corresponding evolution in surface roughness, both by AFM and by light scattering measurements. In the second case, an interpretation of the strong texturing occurring in narrow lines, independently of substrate microstructure, is given on the basis of surface energy calculations.
Texturing, surface energetics and morphology in the C49-C54 transformation of TiSi2
La Via F;
1999
Abstract
In this paper we analyze the extent of grain orientation before and after the C49-C54 transformation in TiSi2, depending on the substrate microstructure and the lateral dimensions of the film. In the former case, for blanket configuration, we make a comparison to the corresponding evolution in surface roughness, both by AFM and by light scattering measurements. In the second case, an interpretation of the strong texturing occurring in narrow lines, independently of substrate microstructure, is given on the basis of surface energy calculations.File in questo prodotto:
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