In the present work, Co3O4-based materials were grown by Plasma Enhanced-Chemical VaporDeposition (PE-CVD) and tested in the detection of reducing analytes (ethanol, acetone). In particular,Co3O4 and F doped Co3O4 deposits were synthesized in the range 200-400°C on polycrystalline Al2O3substrates from Ar-O2 plasmas using Co(dpm)2 (dpm = 2,2,6,6-tetramethyl-3,5-heptanedionate) andCo(hfa)2·TMEDA (hfa = 1,1,1,5,5,5-hexafluoro-2,4-pentanedionate; TMEDA = N,N,N',N'-tetramethylethylenediamine), respectively. In the latter case, a homogeneous fluorine dopingthroughout the whole deposit thickness was achieved, and its content could be controlled as a functionof the deposition temperature. Notably, the sensing performances appreciably improved upon fluorineincorporation into cobalt oxide. To the best of our knowledge, this work is the first example of F dopingin p-type metal oxide nanosystems aimed at enhancing their sensing properties.

Enhancing p-type Co3O4 Gas Sensing Performances by Fluorine Doping

A Gasparotto;D Barreca;C Maccato;E Comini;G Sberveglieri;
2012

Abstract

In the present work, Co3O4-based materials were grown by Plasma Enhanced-Chemical VaporDeposition (PE-CVD) and tested in the detection of reducing analytes (ethanol, acetone). In particular,Co3O4 and F doped Co3O4 deposits were synthesized in the range 200-400°C on polycrystalline Al2O3substrates from Ar-O2 plasmas using Co(dpm)2 (dpm = 2,2,6,6-tetramethyl-3,5-heptanedionate) andCo(hfa)2·TMEDA (hfa = 1,1,1,5,5,5-hexafluoro-2,4-pentanedionate; TMEDA = N,N,N',N'-tetramethylethylenediamine), respectively. In the latter case, a homogeneous fluorine dopingthroughout the whole deposit thickness was achieved, and its content could be controlled as a functionof the deposition temperature. Notably, the sensing performances appreciably improved upon fluorineincorporation into cobalt oxide. To the best of our knowledge, this work is the first example of F dopingin p-type metal oxide nanosystems aimed at enhancing their sensing properties.
2012
Istituto di Chimica della Materia Condensata e di Tecnologie per l'Energia - ICMATE
Plasma Enhanced-Chemical Vapor Deposition
fluorine doping
Co3O4
gas sensors
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/127132
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