In the present work the CVD (Chemical Vapor Deposition) technique was employed for the synthesis of ZnS and CdS nanocrystalline thin films. To this aim, O-isopropyl xanthates [M(O-iPrXan)2; M=Zn, Cd] were synthesised and used as single-source precursors. Film depositions were performed in flowing N2 on silica substrates in a low pressure cold-wall CVD apparatus at temperatures between 200 and 450°C. Film crystallinity was studied by Glancing Incidence X-Ray Diffraction (GIXRD), while their chemical composition was analyzed by X-ray Photoelectron (XPS) and X-ray Excited Auger Electron (XE-AES) Spectroscopies. Their surface morphology was analyzed by Atomic Force Microscopy (AFM). Finally, the optical properties were investigated by UV-Vis absorption spectroscopy.

Nanoscale ZnS and CdS thin films from single-source molecular precursors

L Armelao;D Barreca;G Bottaro;
2003

Abstract

In the present work the CVD (Chemical Vapor Deposition) technique was employed for the synthesis of ZnS and CdS nanocrystalline thin films. To this aim, O-isopropyl xanthates [M(O-iPrXan)2; M=Zn, Cd] were synthesised and used as single-source precursors. Film depositions were performed in flowing N2 on silica substrates in a low pressure cold-wall CVD apparatus at temperatures between 200 and 450°C. Film crystallinity was studied by Glancing Incidence X-Ray Diffraction (GIXRD), while their chemical composition was analyzed by X-ray Photoelectron (XPS) and X-ray Excited Auger Electron (XE-AES) Spectroscopies. Their surface morphology was analyzed by Atomic Force Microscopy (AFM). Finally, the optical properties were investigated by UV-Vis absorption spectroscopy.
2003
Istituto di Chimica della Materia Condensata e di Tecnologie per l'Energia - ICMATE
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/127201
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