The influence of crystal defects formed upon annealing in determining the anomalous distribution of Fe implanted into InP has been studied by comparing samples submitted to single Fe implant and double Fe + P implant in the MeV energy range. It is shown that end of range dislocation loops, as well as interfaces of bands of defects, are preferential sites for gettering and accumulation of Fe.

Influence of the dislocation loops on the anomalous diffusion of Fe implanted into InP

C Frigeri;G Rossetto
1997

Abstract

The influence of crystal defects formed upon annealing in determining the anomalous distribution of Fe implanted into InP has been studied by comparing samples submitted to single Fe implant and double Fe + P implant in the MeV energy range. It is shown that end of range dislocation loops, as well as interfaces of bands of defects, are preferential sites for gettering and accumulation of Fe.
1997
Istituto dei Materiali per l'Elettronica ed il Magnetismo - IMEM
0-87849-786-2
Diffusion
Dislocation Loops
Fe Anomalous
Fe Implantation
InP
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/128131
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