The influence of crystal defects formed upon annealing in determining the anomalous distribution of Fe implanted into InP has been studied by comparing samples submitted to single Fe implant and double Fe + P implant in the MeV energy range. It is shown that end of range dislocation loops, as well as interfaces of bands of defects, are preferential sites for gettering and accumulation of Fe.

Influence of the dislocation loops on the anomalous diffusion of Fe implanted into InP

C Frigeri;G Rossetto
1997

Abstract

The influence of crystal defects formed upon annealing in determining the anomalous distribution of Fe implanted into InP has been studied by comparing samples submitted to single Fe implant and double Fe + P implant in the MeV energy range. It is shown that end of range dislocation loops, as well as interfaces of bands of defects, are preferential sites for gettering and accumulation of Fe.
1997
Istituto dei Materiali per l'Elettronica ed il Magnetismo - IMEM
Inglese
Davies, G; Nazare, MH
DEFECTS IN SEMICONDUCTORS - ICDS-19, PTS 1-3
19th International Conference on Defects in Semiconductors (ICDS-19)
258-263
1807
1812
0-87849-786-2
http://www.scientific.net/MSF.258-263.1807
TRANS TECH-SCITEC PUBLICATIONS LTD
UETIKON
SVIZZERA
Sì, ma tipo non specificato
21-25 July 1997
Aveiro (Portogallo)
Diffusion
Dislocation Loops
Fe Anomalous
Fe Implantation
InP
7
restricted
Frigeri, C; Carnera, A; Fraboni, B; Gasparotto, A; Priolo, F; Camporese, A; Rossetto, G
273
info:eu-repo/semantics/conferenceObject
04 Contributo in convegno::04.01 Contributo in Atti di convegno
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/128131
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