The local structure around Er 3 1 ions in Er 1O doped silicon has been investigated by extended x-ray absorption spectroscopy. By comparing samples obtained by molecular-beam epitaxy and ion implantation a common structure comes out. Er is linked to five or six O atoms at around 2.24 Å and there is a well defined Er-O-Si bond angle of 135° and an Er-Si separation of 3.6 Å. The Er-Si distance is appreciably longer than that found in the more stable structures from ab-initio calculations and a discussion on the possible site for Er is presented.

Structure of Er-O complexes in crystalline Si

FRANCESCO DACAPITO;Scalese S;
2004

Abstract

The local structure around Er 3 1 ions in Er 1O doped silicon has been investigated by extended x-ray absorption spectroscopy. By comparing samples obtained by molecular-beam epitaxy and ion implantation a common structure comes out. Er is linked to five or six O atoms at around 2.24 Å and there is a well defined Er-O-Si bond angle of 135° and an Er-Si separation of 3.6 Å. The Er-Si distance is appreciably longer than that found in the more stable structures from ab-initio calculations and a discussion on the possible site for Er is presented.
2004
Istituto per la Microelettronica e Microsistemi - IMM
Istituto Officina dei Materiali - IOM -
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/13975
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