Current nanotechnology techniques make possible the preparation of slits in the submicrometer range so that electron interference and diffraction experiments can be done even with a conventional electron microscope. If the instrument is also equipped with a field emission source, it is possible to follow almost in real time the transition from the image of the slits to their Fraunhofer pattern through the intermediate Fresnel diffraction images. We discuss our results for the two-slit experiment and illustrate them for the three-slit case. (C) 2011 American Association of Physics Teachers.

Two and three slit electron interference and diffraction experiments

S Frabboni;C Frigeri;GC Gazzadi;
2011

Abstract

Current nanotechnology techniques make possible the preparation of slits in the submicrometer range so that electron interference and diffraction experiments can be done even with a conventional electron microscope. If the instrument is also equipped with a field emission source, it is possible to follow almost in real time the transition from the image of the slits to their Fraunhofer pattern through the intermediate Fresnel diffraction images. We discuss our results for the two-slit experiment and illustrate them for the three-slit case. (C) 2011 American Association of Physics Teachers.
2011
Istituto dei Materiali per l'Elettronica ed il Magnetismo - IMEM
Istituto Nanoscienze - NANO
File in questo prodotto:
Non ci sono file associati a questo prodotto.

I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.

Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/148537
Citazioni
  • ???jsp.display-item.citation.pmc??? ND
  • Scopus 17
  • ???jsp.display-item.citation.isi??? 11
social impact