The structural and chemical details of GeO2/Ge layers grown on In0.15Ga0.85As substrates by molecular beam deposition were studied in situ by diffraction and spectroscopic techniques. The formation of semiconductor-oxygen bonds at the Ge/In0.15Ga0.85As interface, which may play a decisive role in dictating the quality of the Ge passivation, was assessed after using two different surface preparations, namely Ar sputtering and atomic hydrogen cleaning. (C) 2008 American Institute of Physics.
Structure and interface bonding of GeO2/Ge/In0.15Ga0.85As heterostructures
Molle A;Spiga S;Fanciulli M;
2008
Abstract
The structural and chemical details of GeO2/Ge layers grown on In0.15Ga0.85As substrates by molecular beam deposition were studied in situ by diffraction and spectroscopic techniques. The formation of semiconductor-oxygen bonds at the Ge/In0.15Ga0.85As interface, which may play a decisive role in dictating the quality of the Ge passivation, was assessed after using two different surface preparations, namely Ar sputtering and atomic hydrogen cleaning. (C) 2008 American Institute of Physics.File in questo prodotto:
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