The utilization of the water vapor during the CVD of Pt from platinum (II) acetylacetonate enable the films to grow more slowly and more homogeneously along the reactor. The systhem structure, chemical composition and morphology as a function of the processing conditions were analyzed by means of XRD (X-ray Diffraction), XPS (X-Ray Photoelectron Spectroscopy) and AFM (Atomic Force Microscopy). The performance of the Pt-films as electrode materials were investigated by cyclic voltammetry in aqueous solutions containing H2SO4 and Ru(NH3)6Cl3. They displayed voltammograms with features very similar to those of bulk Pt electrodes. Larger than theoretically predicted, cathodic-to-anodic peak potential separations were obtained for very thin cathodic-to-anodic peak potential separations were obtained for very thin Pt-films for the Ru(NH3)6 3+/2+ process, indicating ohmic drop effects.

Nanocrystalline Pt films by MOCVD in the presence of water vapor for electrode use

GERBASI, ROSALBA;BARRECA, DAVIDE
2005

Abstract

The utilization of the water vapor during the CVD of Pt from platinum (II) acetylacetonate enable the films to grow more slowly and more homogeneously along the reactor. The systhem structure, chemical composition and morphology as a function of the processing conditions were analyzed by means of XRD (X-ray Diffraction), XPS (X-Ray Photoelectron Spectroscopy) and AFM (Atomic Force Microscopy). The performance of the Pt-films as electrode materials were investigated by cyclic voltammetry in aqueous solutions containing H2SO4 and Ru(NH3)6Cl3. They displayed voltammograms with features very similar to those of bulk Pt electrodes. Larger than theoretically predicted, cathodic-to-anodic peak potential separations were obtained for very thin cathodic-to-anodic peak potential separations were obtained for very thin Pt-films for the Ru(NH3)6 3+/2+ process, indicating ohmic drop effects.
2005
CHIMICA INORGANICA E DELLE SUPERFICI
Istituto di Chimica della Materia Condensata e di Tecnologie per l'Energia - ICMATE
Istituto di Scienze e Tecnologie Molecolari - ISTM - Sede Milano
Inglese
A. Devi; H. Parala; M.L. Hitchman; R. A. Fischer; M.D. Allendorf
EUROCVD-15, Fiftheenth European Conference on Chemical Vapor Deposition, Proceedings of the International Symposium
EUROCVD-15, Fiftheenth European Conference on Chemical Vapor Deposition
Proceedings Volume 2005-09
715
722
1-56677-427-6
Electrochemical Society
Pennington [NJ]
STATI UNITI D'AMERICA
Sì, ma tipo non specificato
5-9 September, 2005
bochum, germany
platinum
water vapor
cyclic voltammetry
electrodes
2
none
Battiston, Giovanni; Gerbasi, Rosalba; Barreca, Davide
273
info:eu-repo/semantics/conferenceObject
04 Contributo in convegno::04.01 Contributo in Atti di convegno
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/163985
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