We report on the fabrication and electrical characterization of Schottky diodes on epitaxial relaxed germanium for THz detection, which implement both a sub-micron junction area and the air-bridge technology. The small footprint necessary for low capacitances and T-shaped contacts are obtained by using a triple layer of electronic resists with different sensitivity. The cross-sectional analyses revealed a clearly suspended air-bridge and the T-shape of the metal contact with footprint width below 400 nm. The electrical characterization at room temperature shows well defined Schottky diode behavior with ideality factor between 1 and 2 and low series resistance suitable for THz detection.

Fabrication of air-bridge sub-micron Schottky junctions on Ge/SOI for THz detection

E Giovine;A Di Gaspare;M Ortolani;V Foglietti;F Evangelisti;A Notargiacomo
2013

Abstract

We report on the fabrication and electrical characterization of Schottky diodes on epitaxial relaxed germanium for THz detection, which implement both a sub-micron junction area and the air-bridge technology. The small footprint necessary for low capacitances and T-shaped contacts are obtained by using a triple layer of electronic resists with different sensitivity. The cross-sectional analyses revealed a clearly suspended air-bridge and the T-shape of the metal contact with footprint width below 400 nm. The electrical characterization at room temperature shows well defined Schottky diode behavior with ideality factor between 1 and 2 and low series resistance suitable for THz detection.
2013
Istituto di Struttura della Materia - ISM - Sede Roma Tor Vergata
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/18504
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