Silcon grism are very attractive devices as they allow for a spectroscopic mode able to effectively complement the natural imaging mode of IR cameras, providing high spectral resolution. In this paper we describe progress toward the realization of silicon grism by means of chemical etching and electron-beam litography.

Micromachined silicon grisms: high resolution spectroscopy in the near infrared

E Giovine
2000

Abstract

Silcon grism are very attractive devices as they allow for a spectroscopic mode able to effectively complement the natural imaging mode of IR cameras, providing high spectral resolution. In this paper we describe progress toward the realization of silicon grism by means of chemical etching and electron-beam litography.
2000
Istituto di fotonica e nanotecnologie - IFN
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/187500
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