The significance of both the density N, and the apparent built-in voltage V(a), as usually obtained from C-V measurements on Schottky barriers containing DX centers, is clarified. It is also shown that, owing to the non-equilibrium occupancy of the DX center, at low temperature the electron density in the flat-band region depends on the cooling rate of the sample

The influence of the DX center on the capacitance of Schottky barriers in n-type A1GaAs

S Franchi;E Gombia
1991

Abstract

The significance of both the density N, and the apparent built-in voltage V(a), as usually obtained from C-V measurements on Schottky barriers containing DX centers, is clarified. It is also shown that, owing to the non-equilibrium occupancy of the DX center, at low temperature the electron density in the flat-band region depends on the cooling rate of the sample
1991
Istituto dei Materiali per l'Elettronica ed il Magnetismo - IMEM
MOLECULAR-BEAM EPITAXY; SI-DOPED AL(x)GA(1-x)AS; DEEP DONORR
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/188740
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