The significance of both the density N, and the apparent built-in voltage V(a), as usually obtained from C-V measurements on Schottky barriers containing DX centers, is clarified. It is also shown that, owing to the non-equilibrium occupancy of the DX center, at low temperature the electron density in the flat-band region depends on the cooling rate of the sample

The influence of the DX center on the capacitance of Schottky barriers in n-type A1GaAs

S Franchi;E Gombia
1991

Abstract

The significance of both the density N, and the apparent built-in voltage V(a), as usually obtained from C-V measurements on Schottky barriers containing DX centers, is clarified. It is also shown that, owing to the non-equilibrium occupancy of the DX center, at low temperature the electron density in the flat-band region depends on the cooling rate of the sample
1991
Istituto dei Materiali per l'Elettronica ed il Magnetismo - IMEM
Inglese
50
1-4
400
404
5
http://www.sciencedirect.com/science?_ob=ArticleListURL&_method=list&_ArticleListID=-347979064&_sort=r&_st=13&view=c&_acct=C000228598&_version=1&_urlVersion=0&_userid=10&md5=75c8f1086ac1077147e393b141e15c9a&searchtype=a
Sì, ma tipo non specificato
MOLECULAR-BEAM EPITAXY; SI-DOPED AL(x)GA(1-x)AS; DEEP DONORR
3
info:eu-repo/semantics/article
262
C. GhezziR. Mosca; A. Bosacchi; S. Franchi;E. Gombia
01 Contributo su Rivista::01.01 Articolo in rivista
none
File in questo prodotto:
Non ci sono file associati a questo prodotto.

I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.

Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/188740
Citazioni
  • ???jsp.display-item.citation.pmc??? ND
  • Scopus ND
  • ???jsp.display-item.citation.isi??? 1
social impact