As-grown Fe-doped semiconducting InP wafers (residual carrier concentration less than or equal to 10(15) cm(-3), estimated iron concentration 5-8 x 10(15) cm(-3)) were converted to semi-insulating, with high resistivity and good mobility, when annealed under appropriate conditions. This fact is very interesting, since it permits the preparation of semi-insulating InP with an Fe content substantially lower than that of standard as-grown material. In this article, we report the annealing parameters, together with the results of an extensive characterization (Hall effect, C-V, infrared absorption, and photoinduced current transient spectroscopy) of the treated samples. The onset of the semiinsulating regime seems to be primarily due to an annealing-related loss of shallow donors. (C) 1997 American Institute of Physics.

Conductivity conversion of lightly Fe-doped InP induced by thermal annealing: A method for semi-insulating material production

A Zappettini;E Gombia;R Mosca;
1997

Abstract

As-grown Fe-doped semiconducting InP wafers (residual carrier concentration less than or equal to 10(15) cm(-3), estimated iron concentration 5-8 x 10(15) cm(-3)) were converted to semi-insulating, with high resistivity and good mobility, when annealed under appropriate conditions. This fact is very interesting, since it permits the preparation of semi-insulating InP with an Fe content substantially lower than that of standard as-grown material. In this article, we report the annealing parameters, together with the results of an extensive characterization (Hall effect, C-V, infrared absorption, and photoinduced current transient spectroscopy) of the treated samples. The onset of the semiinsulating regime seems to be primarily due to an annealing-related loss of shallow donors. (C) 1997 American Institute of Physics.
1997
Istituto dei Materiali per l'Elettronica ed il Magnetismo - IMEM
INDIUM-PHOSPHIDE; ELECTRICAL-PROPERTIES; SEMIINSULATING INP; UNDOPED INP; CAPACITANCE
File in questo prodotto:
Non ci sono file associati a questo prodotto.

I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.

Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/192572
Citazioni
  • ???jsp.display-item.citation.pmc??? ND
  • Scopus ND
  • ???jsp.display-item.citation.isi??? ND
social impact