The Schottky barrier height in Al/n-In(0.35)Ga(0.65)As was engineered using thin p-type near-interface In(0.35)Ga(0.65)As layers grown by molecular beam epitaxy. The effect of the thickness and doping level of the p-type layer on the barrier height was also studied by computer simulation. A good agreement was obtained between the calculated and experimental barrier height values. An experimental Schottky barrier height of 0.67 eV with an ideality factor of 1.15 has been achieved.

Engineered Schottky barriers on n-In(0.35)Ga(0.65)As

S Franchi;P Frigeri;E Gombia;R Mosca;
2001

Abstract

The Schottky barrier height in Al/n-In(0.35)Ga(0.65)As was engineered using thin p-type near-interface In(0.35)Ga(0.65)As layers grown by molecular beam epitaxy. The effect of the thickness and doping level of the p-type layer on the barrier height was also studied by computer simulation. A good agreement was obtained between the calculated and experimental barrier height values. An experimental Schottky barrier height of 0.67 eV with an ideality factor of 1.15 has been achieved.
2001
Istituto dei Materiali per l'Elettronica ed il Magnetismo - IMEM
Schottky barriers; Barrier height engineering; InGaAs; Computer simulation
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/193387
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