Empowering an indirect band-gap material like Si with optical functionalities, firstly light emission, represents a huge advancement constantly pursued in the realization of any integrated photonic device. We report the demonstration of giant photoluminescence (PL) emission by a newly synthesized material consisting of crystalline faceted Si grains (fg-Si), a hundred nanometer in size, assembled in a porous and columnar configuration, without any post processing. A laser beam with wavelength 632.8 nm locally produce such a high temperature, determined on layers of a given thickness by Raman spectra, to induce giant PL radiation emission. The optical gain reaches the highest value ever, 0.14 cm/W, representing an increase of 3 orders of magnitude with respect to comparable data recently obtained in nanocrystals. Giant emission has been obtained from fg-Si deposited either on glass or on flexible, low cost, polymeric substrate opening the possibility to fabricate new devices.

Giant photoluminescence emission in crystalline faceted Si grains

Alessandra Alberti;Rosa Ruggeri;Giovanni Mannino
2013

Abstract

Empowering an indirect band-gap material like Si with optical functionalities, firstly light emission, represents a huge advancement constantly pursued in the realization of any integrated photonic device. We report the demonstration of giant photoluminescence (PL) emission by a newly synthesized material consisting of crystalline faceted Si grains (fg-Si), a hundred nanometer in size, assembled in a porous and columnar configuration, without any post processing. A laser beam with wavelength 632.8 nm locally produce such a high temperature, determined on layers of a given thickness by Raman spectra, to induce giant PL radiation emission. The optical gain reaches the highest value ever, 0.14 cm/W, representing an increase of 3 orders of magnitude with respect to comparable data recently obtained in nanocrystals. Giant emission has been obtained from fg-Si deposited either on glass or on flexible, low cost, polymeric substrate opening the possibility to fabricate new devices.
2013
Istituto per la Microelettronica e Microsistemi - IMM
SILICON PHOTONICS
APPLIED PHYSICS
NANOPARTICLES
ELECTRONIC PROPERTIES AND MATERIALS
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/19404
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