Geometric parameters of NiO films epitaxially grown on Ag(001) were determined using two independent experimental techniques and ab initio simulations. Primary beam diffraction modulated electron emission experiments determined that the NiO films grow with O on top of Ag and that the oxide/metal interface distance is d=2.3+/-0.1 Angstrom. Polarization-dependent x-ray absorption, at the Ni-K edge, determined the tetragonal strain (r(parallel to)=2.046+/-0.009 Angstrom, r(perpendicular to)=2.12+/-0.02 Angstrom) and d=2.37+/-0.05 Angstrom. Periodic slab model results agree with the experiments (d=2.40, r(parallel to)=2.07, r(perpendicular to)=2.10 Angstrom; the O-on-top configuration is the most stable).

Oxide/metal interface distance and epitaxial strain in the NiO/Ag(001) system

P Luches;S Valeri;F Boscherini
2003

Abstract

Geometric parameters of NiO films epitaxially grown on Ag(001) were determined using two independent experimental techniques and ab initio simulations. Primary beam diffraction modulated electron emission experiments determined that the NiO films grow with O on top of Ag and that the oxide/metal interface distance is d=2.3+/-0.1 Angstrom. Polarization-dependent x-ray absorption, at the Ni-K edge, determined the tetragonal strain (r(parallel to)=2.046+/-0.009 Angstrom, r(perpendicular to)=2.12+/-0.02 Angstrom) and d=2.37+/-0.05 Angstrom. Periodic slab model results agree with the experiments (d=2.40, r(parallel to)=2.07, r(perpendicular to)=2.10 Angstrom; the O-on-top configuration is the most stable).
2003
Istituto Nanoscienze - NANO
MGO THIN-FILMS
ELECTRONIC-PROPERTIES
ATOMIC ENVIRONMENT
POINT-DEFECTS
NIO
SUR
CHEMISORPTION
SIMULATION
CHEMISTRY
AG(001)
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/201314
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