The electrical and structural characteristics of the samarium-silicon contact have been investigated after thermal treatments up to 300°C for 30 min in vacuum. Good Schottky barriers have been realized for treatments up to 200°C obtaining a barrier height of 0.70 eV. The electrical barrier properties degrade at temperatures above 250°C, where a continuous Layer of SmSi1.7 is formed.

SAMARIUM AS A SCHOTTKY-BARRIER ON P-TYPE-SILICON

NIPOTI R;
1986

Abstract

The electrical and structural characteristics of the samarium-silicon contact have been investigated after thermal treatments up to 300°C for 30 min in vacuum. Good Schottky barriers have been realized for treatments up to 200°C obtaining a barrier height of 0.70 eV. The electrical barrier properties degrade at temperatures above 250°C, where a continuous Layer of SmSi1.7 is formed.
1986
Istituto per la Microelettronica e Microsistemi - IMM
Schotky barrier
silicon
samarium
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/204059
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