An experiment for the indium phosphide deposition from phosphorus hydride and trimethyl indium was performed on a laboratory RPE-MOCVD reactor with or without plasma. The in situ production, plasma precracking of phosphorus hydride and indium phosphide growth process was investigated by mass spectrometry and optical emission spectroscopy was used to analyze the emitting species present in the plasma phase.
IN-SITU MASS-SPECTROMETRIC DIAGNOSTICS DURING INP DEPOSITION IN A REMOTE PLASMA-ENHANCED MOCVD SYSTEM
Losurdo M;Cicala G;
1994
Abstract
An experiment for the indium phosphide deposition from phosphorus hydride and trimethyl indium was performed on a laboratory RPE-MOCVD reactor with or without plasma. The in situ production, plasma precracking of phosphorus hydride and indium phosphide growth process was investigated by mass spectrometry and optical emission spectroscopy was used to analyze the emitting species present in the plasma phase.File in questo prodotto:
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