Abstract -- The utilization of the SU-8 negative photoresist for the realization of RF MEMS switches has been studie d. The key elements of the exploited process are the Shipley 1818 positive photo-resist and the Microchem SU-8 negative one. The two polymeric materials are widely used in MEMS device processes because of their excellent thermal and chemical stability. In this paper, both polymers have been utilized to get suspended structures as double clamped beams: (i) SU-8 for the lateral supports, and (ii) S1818 as a sacrificial layer for the release of the suspended membrane.
SU-8 based Processes for the Realization of RF MEMS Structures
Andrea Lucibello;Marco Maiani;Emanuela Proietti;Romolo Marcelli
2009
Abstract
Abstract -- The utilization of the SU-8 negative photoresist for the realization of RF MEMS switches has been studie d. The key elements of the exploited process are the Shipley 1818 positive photo-resist and the Microchem SU-8 negative one. The two polymeric materials are widely used in MEMS device processes because of their excellent thermal and chemical stability. In this paper, both polymers have been utilized to get suspended structures as double clamped beams: (i) SU-8 for the lateral supports, and (ii) S1818 as a sacrificial layer for the release of the suspended membrane.File in questo prodotto:
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