Transmission electron microscopy, high resolution x-ray diffraction and Rutherford backscattering study of strain release in InGaAs/GaAs buffer layer

Strain release and dislocation distribution in InGaAs/GaAs double heterostructures, step-graded and linear-graded buffer layers have been studied. A higher misfit dislocation density at the inner interface between InGaAs layer and the substrate was found in all the samples. This corresponded to a strain release of the inner ternary layers much larger than predicted by equilibrium theories. The residual parallel strain of the external layers as a function of their thickness was found to follow a curve approx. of slope -0.5, in agreement with previous investigations on single InGaAs layers. This result has been interpreted as evidence that the elastic energy per unit interface area remains constant during the epilayer growth. The presence of numerous single and multiple dislocation loops inside the substrate was attributed to the strain relaxation occurring through dislocation multiplication via Frank-Read sources activated during the growth. A comparison with InGaAs/GaAs step-graded and linear-graded heterostructures is also shown and briefly discussed. Finally, lattice plane tilts between epilayers and substrates have been found due to the imbalance in the linear density of misfit dislocations with opposite component of the Burger vector, b .perp.eff, perpendicular to the interface.