A new interferometric temperature sensor in silicon technology, suitable for full integration with other standard opto- and micro-electronic devices, has been realised. The sensor consists of a planar Fabry-Perot cavity defined on a chip by highly anisotropic Reactive Ion Etching. Temperature variations are detected by monitoring the transmitted intensity of a probing monochromatic (? = 1.5 ?m) light beam launched into the cavity. A 1700 ?m long cavity is demonstrated to allow a temperature resolution of about 1 K. Predictions on the limit resolution attainable with this technology are also given.

Temperature micro-sensor based on the thermo-optic effect in silicon

Iodice;Mario;Rendina;Ivo;
1995

Abstract

A new interferometric temperature sensor in silicon technology, suitable for full integration with other standard opto- and micro-electronic devices, has been realised. The sensor consists of a planar Fabry-Perot cavity defined on a chip by highly anisotropic Reactive Ion Etching. Temperature variations are detected by monitoring the transmitted intensity of a probing monochromatic (? = 1.5 ?m) light beam launched into the cavity. A 1700 ?m long cavity is demonstrated to allow a temperature resolution of about 1 K. Predictions on the limit resolution attainable with this technology are also given.
1995
Cavity resonators
Light transmission
Microelectronic processing
Reactive ion etching
Refractive index
Semiconducting silicon
Substrates
Temperature
Waveguides
Fabry-Perot cavity
Temperature micro-sensor
Thermo-optic effect
Optical sensors
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/217093
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